| 1. | And the feasibility , necessary condition , affecting factors and densification process of low temperature sintering of uo _ 2 have been discussed
2 、计算发现,温度一定时x与氧分压的1 / 6次方成比例。 |
| 2. | The formation rate of u3o8 is insensitive to the partial pre ssure of oxygen , and decreased with the pressure of oxygen drop
对比各种实验环境，发现300下u _ 3o _ 8的生成速度随着氧气分压的减小而变慢。 |
| 3. | When the sputtering pressure keeps constant , the transmittance of the films first increase , and then decrease subsequently with the ar partial pressure of the films increase
溅射气体总压一定时，薄膜透过率随氩气分压的升高先升高后降低。 |
| 4. | As the partial pressure of o2 increases the cathode voltage of the target increases in order to maintain the same current intensity and the sedimentation rate gradually decreases
氧气分压的增大，维持同样溅射电流强度的靶阴极电压增大，薄膜的沉积速率逐渐减小。 |
| 5. | The statistical method of repeated data of variance analysis was used to compare the difference of oxygen partial pressure and calcium ion concentration between the acupoints and non - acupoints
用方差分析方法对穴位和非穴位钙离子浓度和氧分压的差异和变化趋势进行统计分析。 |
| 6. | The oxygen desorption activation energy of ybaacuso7 - x was obtained by different heating rates and the relationship between resistivity of yba2cu3o7 - x and oxygen pressure was measured
用多个升温速率方法得到了ybco的氧脱附活化能。实验测量了ybco的电阻率随氧分压的变化关系。 |
| 7. | The structure tests showed that n2 partial pressure could change the percent of sp ^ c in cnx coatings the effects of cnx and dlc coatings on mouse fibroblasts and human endothelial cells were determined by scanning electron microscopy
研究发现，在其它条件一定的情况下，氮气分压对薄膜n含量的影响是至关重要的。随着n _ 2气分压的增大， cn膜中的n含量增加。 |
| 8. | Its oxygen - sensitivity is related to its oxidation and reduction process and non - stoichiometric ratio . in la _ 2nio _ 4 + system with excess oxygen , the conductivity is in proportion to o21 / 6 . the effect of doping on a and b site have been studied in this paper
其本身的氧化还原过程和非化学计量是其氧敏性的根源，在氧过剩的la _ 2nio _ 4 +系统中载流子浓度与氧分压的1 / 6次方成正比。 |
| 9. | The xrd showed that the crystalline of samples prepared in various o _ ( 2 ) partial pressure and various sputtering power was amorphous , the anatase crystalline formed when heat treatment temperature was above 450 , and heat treatment temperature was higher , the crystalline was better . sem showed that the crystal grams formed on the surface of films when the o _ ( 2 ) partial pressure was high ; the obvious and big grains appeared hi the surface with improvement of heat treatment temperature
Xrd分析表明，不同氧气分压下制备的样品基本是无定型结构，不同溅射功率下制备的样品基本也是无定型结构，当热处理温度高于450时，试样出现了晶面趋向为( 101 )的锐钛矿相，随着热处理温度的升高，结晶程度增大； sem分析表明：随着氧气分压的升高，试样表面出现微小结晶颗粒；随着热处理温度的升高，试样表面出现了相当明显的结晶颗粒，试样的比表面积增大。 |
| 10. | Sem results show tin films appear compact and plane in different n2 partial pressure , and there is no big crystal grain appearance on the surface of tin films . tem and afm results tin films have the column structure , and the surfaces of the films are accumulated by crystal grain . in the second part of the thesis the effect of heat treatment processing on the optical properties and structure of the tin films is studied
Tem测试结果显示，薄膜表面是由tin晶体颗粒堆积在一起，呈柱状结构afm测试结果表明， tin薄膜呈柱状结构；在氮气分压较小时， tin薄膜表面比较平整，颗粒细小；随着氮气分压的增加， tin薄膜表面颗粒逐渐增大；相同氮气分压下，氩气分压较小时制备的tin薄膜较为致密。 |
