| 1. | Hot - pressing sintering of w - 15cu alloy
热压烧结制备高密度钨铜合金 |
| 2. | The physical properties and high temperature oxidation resistance of the ti3sic2 samples were studied
研究了热压烧结ti _ 3sic _ 2的物理性能和高温抗氧化性能。 |
| 3. | Analyzing the influence factors for the performance of diamond drill bit in hot pressure sintering process of intermediate - frequency furnace
浅析中频热压烧结过程中影响金刚石钻头性能的因素 |
| 4. | The la1 - xsrxmno3 powder has been sintered by constant pressure sintering , heat pressure sintering ( hp ) and spark plasma sintering ( sps )
通过无压烧结，热压烧结和sps烧结工艺对lal . xsrxmno3粉末进行烧结，其中sps烧结在900 ，保温1omin得到的烧结样品致密化程度最好。 |
| 5. | This thesis reports some results on the hot press sintering of nano - composite wc - co powder , which is prepared by spray pyrogenation & continuous deoxidization and carbonization process
本课题采用热压烧结技术对以喷雾热解?连续还原碳化法制备的纳米复合wc - co粉末进行了热压烧结研究。 |
| 6. | Considering the growing of nano - sized powder during sintering and to improve the physical performance , some sintering research about the addition of inhibitor vc has been done
针对纳米粉末在烧结中容易长大的特点，也为了改善材料的物理性能，对添加抑晶剂vc的原料粉末的热压烧结进行了一些研究。 |
| 7. | The sintering time also affects the specimens " properties . nano - composite wc - co powder can be hot press sintered to cermet whose hra is 94 . 6 and trs is 1183 mpa under 1350 for 2 hours
最终烧结实验表明纳米复合wc - co粉末1350保温2小时条件下的热压烧结可以获得抗弯强度为1183mpa ，洛氏硬度为94 . 6的硬质合金。 |
| 8. | Differential thermal analysis ( dta ) of starting powers and x - ray diffraction ( xrd ) of samples sintered at different temperatures from 600 c to 1300 c by hot pressing were utilized to analyse the phase composition
采用原位热压烧结工艺，通过差热分析和x衍射图谱，分析了600 1300不同烧结温度下烧结所得产物的相组成。 |
| 9. | Using aluminium sulfate and colloidal silica as raw materials , another kind of mullite precursor powders is made . the relative density of silica - rich mullite ceramic sintered from these powders at 1550 for 1 hour with a pressure of 15mpa is 97 %
以硫酸铝、硅溶胶为原料，采用溶胶-凝胶法制备了莫来石先驱体粉末，所得富硅莫来石先驱体粉末在1550 、 15mpa下热压烧结1小时后，致密度达97 。 |
| 10. | In this article , by rf sputtering the licoo _ 2 film was produced . by hot pressing and cold pressing ( and sintering ) , the licoo _ 2 targets used in the rf sputtering were produced differently . both technics of the preparation of the licoo _ 2 film and the licoo _ 2 target were studied
本文使用热压烧结方法和冷压后烧结方法制备了磁控溅射用的licoo _ 2靶材,并使用磁控溅射方法制备了licoo _ 2薄膜,对两者的制备工艺进行了研究。 |
