| 1. | General specification for magnetic sputtering equipment
磁控溅射设备通用技术条件 |
| 2. | Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 |
| 3. | To discuss the technological project of setting up many ethernets
磁控溅射真空制膜技术 |
| 4. | Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究 |
| 5. | All samples were prepared by rf magnetron sputtering method
所有样品采用射频辅助磁控溅射方法制备。 |
| 6. | Fabrication of thin film on stainless steel using magnetron sputtering technique
磁控溅射制备不锈钢薄膜研究 |
| 7. | Development of cylindrical rotating magnetrons with high target utilization rate
高靶材利用率的新型磁控溅射器 |
| 8. | Properties of diamond like carbon films prepared by rf magnetron sputtering
射频磁控溅射制备类金刚石薄膜的特性 |
| 9. | Metallization of smd inductor of ferrite ceramics by magnetron sputtering
铁氧体磁芯的磁控溅射金属化工艺的研究 |
| 10. | Simulation study on the starting method of medium - frequency power supply based on matlab
磁控溅射中频电源仿真研究 |
