| 1. | Computer simulation and the modeling of thin film growth 薄膜生长模型与计算机模拟 |
| 2. | Cellular automata simulation of magnetic thin film growth process 磁性薄膜生长的元胞自动机模拟 |
| 3. | Computer simulation of thin film growth 薄膜生长的计算机模拟 |
| 4. | Influence of silicon carbide on diamond film growth on heterogeneous substrates 在异质衬底生长金刚石膜的作用分析 |
| 5. | Off - lattice kinetic monte carlo simulation of initial stage of tin film growth 薄膜生长过程中孔洞填充的蒙特卡罗模拟 |
| 6. | The investigational results on the films growth are of much innovation 关于薄膜生长的研究在现阶段具有一定的创新性。 |
| 7. | Hysteresis in aluminum oxides films growth with pulsed reactive sputtering 铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究 |
| 8. | The optimal condition for p - sic film growth is found and nanocrystalline p - sic film is prepared under suitable condition 探索到了低温沉积- sic薄膜的最佳工艺条件,并在一定条件下制备出了纳米晶- sic薄膜。 |
| 9. | In this thesis , the rtcvd equipment that suitable for the growth of sic thin film was studied , and the sic thin film growth process was primarily explored 本文主要探索适用于碳化硅薄膜生长的rtcvd装置,并对生长工艺进行了初步探索。主要工作包括: 1 |
| 10. | Surface morphology and composition of the a1 film were characterized with field emission scanning electron microscopy ( fesem ) and energy dispersive spectroscopy ( eds ) to optimize a1 film growth conditions 利用场发射扫描电镜( fesem )及能量散射谱( eds )分析仪对沉积的铝层进行了表面形貌的表征和化学组分的分析。 |