| 1. | For the coordination of the contradictory , the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask . it includes : pupil filtering , phase shift mask , off - axis illumination , optical proximity correction , and so on
为了协调这种矛盾，利用波前工程来改善光刻图形的质量以提高光刻分辨率，已广泛地应用于光学光刻中，如：瞳孔滤波、相移掩模、离轴照明、光学邻近效应校正等。 |
