Chinese translation for "等离子体刻蚀"

plasma etch

Related Translations:

氦等离子体:  helium-piston

等离子体禁闭:  plasma confinementplasma containment

等离子体寿命:  plasma lifetime

水蒸汽等离子体:  water-vapor plasma

宇宙等离子体:  cosmical plasma

天体等离子体:  astrophysical plasma

辐照等离子体:  irradiated plasma

等离子体片:  plasma sheetplasmasheet

碰撞等离子体:  collision dominated plasmacollisional plasma

稀薄等离子体:  rarefied plasma

Example Sentences:

	1.	Influence of process parameters on the etching rate in inductively coupled plasma etcher 等离子体刻蚀中工艺参数对刻蚀速率影响的研究
	2.	Hardware and software design for the inductively coupled plasma etching machine " s system are also presented 介绍了plc控制等离子体刻蚀机的硬件系统和软件系统的设计。
	3.	Effect of microwave plasma etching decarburization onadhesive strength and cutting performance of cvd diamond coated tools 微波等离子体刻蚀处理对金刚石薄膜涂层刀具附着力和切削性能的影响
	4.	Via the experiment , the best etching process of etching insb - in material with chclfi plasma is confirmed . and the mechanism is also analyzed and discussed 通过实验确定该条件下chclf _ 2等离子体刻蚀insb - in的最佳工艺，并分析探讨chclf _ 2等离子体刻蚀insb - in薄膜的机理。
	5.	Finally , according to the technique of plasma etching , an evolution model describing the spatio - temporal profiles of the micro - trench is established . and that we simulated the effects of collisions and the source parameters on the etching profiles 最后，针对等离子体刻蚀工艺，建立了微结构区剖面的时空演化模型，并模拟了碰撞效应和电源参数对刻蚀剖面演化的影响。
	6.	When the two layers of sio2 with different refractive index are finished , the designed mask pattern is printed on the film by photolithography . after that , icp is performed for dry etching , then , the waveguide structures are obtained . at present , the rudimental graph of edg has been obtained 两层不同折射率的sio _ 2薄膜制备好之后，经过光刻、等离子体刻蚀( icp )的工艺步骤之后，形成了波导结构，初步制作出了器件的图形。
	7.	In a word , the two type of voa both have valuable applicability and potential market . the author have done numerous processing to work out new processing such as polymer coating and cure and triple - layer - metal film vaporing . other new processing , polymer ultra - violet ( uv ) cure and inductively - coupled plasma ( icp ) etching were studied 作者经过反复的工艺实验，确定了聚合物波导涂膜和固化、三层金属电极蒸发和腐蚀等新工艺的参数，并得到了聚合物紫外固化、等离子体刻蚀等新工艺的初步数据。

Similar Words：

"等离子体聚焦" Chinese translation, "等离子体聚焦点" Chinese translation, "等离子体抗蚀剂灰化系统" Chinese translation, "等离子体科学和技术" Chinese translation, "等离子体科学和技术（英文版）" Chinese translation, "等离子体刻蚀工艺" Chinese translation, "等离子体刻蚀机" Chinese translation, "等离子体空间滤光片" Chinese translation, "等离子体扩散" Chinese translation, "等离子体离子振荡" Chinese translation