| 1. | In this paper , the research actuality status of zno thin film ’ s structural character , preparation methods and electrical - optical properties is summarized . the effect of sputtering parameters , annealing parameters and doped sb2o3 on the structure , optical absorption and electrical properties of zno thin film is studied by sem , xrd , xps , eds , uv - vis spectrophotometer , hall effect detector , four - point probe electric resistance measurement and direct - current impedance measurement etc . the results of sem , xrd and edx show that zno thin film possesses good processing stability
本文在综述zno薄膜的结构特性、制备方法和光电性能等现状的基础上,采用射频磁控溅射技术制备了纯和sb _ 2o _ 3掺杂的zno薄膜,采用sem 、台阶仪、 xrd 、 xps 、 uv - vis分光光度计分析、电阻仪、阻抗谱仪等仪器设备分别研究了溅射工艺参数、退火工艺参数和sb _ 2o _ 3掺杂对zno薄膜结构特性、光吸收性能和电学特性的影响规律。 |
