| 1. | There are two parts in the paper , the first is about the principles of opc , lithography simulation algorithms , opc implementation and based on nanoscope , a verification tool , some verification to corrected designs are implemented
本文主要包括两部分，第一部分主要介绍了光学邻近校正的原理，光刻模拟算法和光学邻近校正的实现，并且基于软件nanoscope对一些进行过光学邻近校正处理的设计进行可制造性检查，并对结果进行总结。 |
