| 1. | Specification for round quartz photomask substrates
圆形石英玻璃光掩模基板规范 |
| 2. | Guidelines for photomask defect classification and size definition
光掩模缺陷分类和尺寸定义的准则 |
| 3. | Test method for distortion of optical lenses used in photomask fabrication
光掩膜制作用光学透镜畸变的试验方法 |
| 4. | Hard surface photomask substrates
硬面光掩模基板 |
| 5. | Test method for calibration verification of laser diffraction particle sizing instruments using photomask reticles
用光掩模原版校准检验激光绕射粒子定尺寸仪器的试验方法 |
| 6. | Determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性 |
| 7. | The principle , theory , realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated . an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built , and the experimental research is carried out
对全息光刻的原理、理论、实现方法及传统光掩模?全息掩模?抗蚀剂图形传递机理进行了深入的研究，设计和建立了采用直角棱镜和折射率匹配液的全内反射波前共轭全息光刻实验系统，进行了实验研究。 |
