| 1. | General rules for x - ray photoelectron spectroscopic analysis method
X射线光电子能谱分析方法通则 |
| 2. | Standard practice for checking the operation characteristics of x - ray photoelectron spectrometers
检查x射线光电子能谱仪工作特性的标准方法 |
| 3. | Standard guide for specimen handling in auger electron spectroscopy and x - ray photoelectron spectroscopy
俄歇电子能谱术和x射线光电子能谱术的样品处理标准导则 |
| 4. | Standard practice for reporting data in auger electron spectroscopy and x - ray photoelectron spectroscopy
俄歇电子光谱仪和x射线光电子能谱的报告数据的标准规程 |
| 5. | The x - ray photoelectron spectroscopy ( xps ) spectra data demonstrate that stoichiometric ceo2 is formed
通过x射线光电子能谱( ” s )证实了化学计量的ceo :己经形成。 |
| 6. | The thermal stability of high - k thin film deposited on si substrate has been studied using x - ray photoelectron spectroscopy ( xps )
通过x射线光电子能谱对沉积在si基底上的high - k薄膜的热稳定性进行了研究。 |
| 7. | The substrates were biased by dc voltage negatively with respect to ground . the films were characterized by infrared spectra and x - ray photoelectron spectroscopy ( xps )
薄膜成分以红外吸收谱和x射线光电子能谱标识，薄膜形貌以原子力显微镜观测。 |
| 8. | The xps measurements confirmed the presentation of poms and doda ( ddda ) in the multibilayers . the photoluminescent spectrum exhibit characteristic photo luminescence of the eu3 + ion , basically similar to those found for the polyoxometalate solids
X射线光电子能谱结果表明pom在膜中的存在，并且表明前驱体膜中的氯离子已经完全被多阴离子交换掉，这与前面的结论相一致。 |
| 9. | By means of esca , igc , wd , dsc ) sem and computer aided image processing technique , the relations of composite ' s microsimcture and macroscopic properties were researched and conclusions were listed as follows . l
借助x射线光电子能谱( esca ) 、反相气相色谱( igc ) 、 x射线衍射分析、 dsc分析和扫描电镜( sem )等测试手段和计算机图像处理技术，分析了材料微观结构与宏观性能间的关系，取得了如下结果。 |
| 10. | 2 studying of the properties of cbn thin films afm showed that cbn thin film delaminated from substrate obviously . basing xps , we calculate the nib ratio to be 0 . 90 that is closing to unity , and the thickness of hbn layer on cbn layer that is about 0 . 80 nm
根据x射线光电子能谱，计算得到立方氮化硼薄膜中的n和b的原子数比为0 . 90 ，接近理想化学配比1 ；立方氮化硼薄膜顶层的六角氮化硼的厚度约为0 . 80nm 。 |
