The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current . accelerate voltage has less effect on these properties 溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；加速电压对两者影响较小；石墨靶的最佳入射角为50 。
