English translation for "工作气压"
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- working air pressure
Related Translations:
气压成型: air pressure formingblow moldinggas-pressure compactinggas-pressure compaction 气压降低: lowering of atmospheric pressure 气压增加: increase of gas pressure 气压传动: part two pneumatic transmissionpneumatic actuationpneumatic drivepneumatic transmission
- Example Sentences:
| 1. | Process parameters included rf power , substrate negative bias voltage , substrate temperature and working gas pressure
工艺参数有射频功率、衬底负偏压、衬底温度和工作气压等。 | | 2. | We studied the relationship of pressure , flux of sih4 and substrate temperature with deposition rate of a - si : h films
我们研究了工作气压、 sih _ 4气体流量和衬底温度等工艺条件与a - si : h薄膜沉积速率的关系。 | | 3. | There is a threshold value of gas pressure too . cbn forms only if pressure under than o . spa . for the first time , it was found that substrate influences the depositing of cbn
对于工作气压，同样存在气压阈值，高于该阈值不能产生立方氮化硼，我们的气压阈值为0 . 8pa 。 | | 4. | The influence of various factors , such as substrate bias voltage and temperature , working gas pressure , types of si wafer , etc . on the preparation of cbn has been studied systematically
系统地研究了衬底偏压、衬底温度、工作气压、 si晶片的类型等多种因素对制备cbn薄膜的影响。 | | 5. | The influence arising from the anode voltage and gas pressure of gas - flow proportional counter and ambient temperature on the measuring error of the setup has been investigated by means of experiment
实际测得了流气正比计数管阳极高压、工作气压和环境温度对软x射线荧光测量装置测量误差的影响。 | | 6. | The intense ( 002 ) peak of zno thin film increased with the reducing of o / ar ratio in the growing ambient , and orientation of zno thin films became weakness with the increasing of sputtering gas pressure
随着溅射气氛中氧氩比的减小, zno ( 002 )峰明显加强,而工作气压的增加,并不利于zno择优取向生长。衬底温度的增加则有利于zno择优取向生长。 | | 7. | The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd . when the temperature ( ts < 450 , ta < 800 ) is low , the structure of the samples is still amorphous . the majority content of the sample is sio 90 by the aid of xps
利用双离子束溅射沉积技术，通过共溅射方法制备了si - sio _ 2薄膜，研究了沉积时间、工作气压p _ ( ar ) 、基片温度等对沉积速率的影响，用tem和xrd分析了样品的结构。 | | 8. | The relationship between spectrum and preparation conditions were studied in this paper . the results are listed as following . the transmission of ultrathin aluminum films increase evidently , when the working pressure arise . with the increase of sputtering time , the transmission of ultrathin aluminum films decrease linear
然后利用双光束分光光度计测定了其透光率,研究了透光性能与各制备条件之间的关系,发现,随着工作气压、基片温度、靶基距的增大,薄膜的透光率有不同程度的增大;但透光率随着溅射时间的增加而呈近线性下降。 | | 9. | By varying mo - to - si ratio ( ) , stress in multilayers - can be compensated to a certian extent / and 13mpa low - stress mo / si multilayers is fabricated . this research is supported by the national natural science foundation of china and " 863 " project of china and innovation foundation of china academy of sciences
实验发现，通过改变多层膜两种材料的比率、改变ar气工作气压等方法，可以在一定程度上补偿因贯穿扩散产生的压应力，而采用同时改变比率和ar气工作气压可以控制多层膜中残余应力。 | | 10. | Using jgp560c magnetron sputtering equipment , cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power , gas flow , vacuum air pressure , magnetoelectricity power and substrate temperature on deposition rate of film , discovered that dc sputtering power is the most key factor influencing the deposition rate
在jgp560c型超高真空多功能磁控溅射镀膜机上，采用直流磁控溅射法在cdznte晶体上制备出cu ag合金薄膜，揭示了气体流量、直流溅射功率、励磁电源功率、工作气压和衬底温度等工艺参数对沉积速率的影响规律。结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。 |
- Similar Words：
- "工作其含义与数据链路级别" English translation, "工作起始记录" English translation, "工作器" English translation, "工作气缸" English translation, "工作气体" English translation, "工作汽缸" English translation, "工作汽压" English translation, "工作钳" English translation, "工作前角" English translation, "工作前景不明朗" English translation
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