| 1. | Specifications of physical vapour deposition tin films
物理气相沉积tin薄膜技术条件 |
| 2. | Characterization of zn 2 183 ; h2o synthesized by cvd
化学气相沉积产物的表征 |
| 3. | Magnetic - field - aided plasma enhanced chemical vapor deposition
磁场辅助等离子体增强化学气相沉积 |
| 4. | Current situation and development trend of vapor deposition technology
气相沉积技术的现状与发展 |
| 5. | Cv chemical vapor deposition cv equipment
化学气相沉积法设备 |
| 6. | Cvd chemical vapor deposition equipment
化学气相沉积法设备 |
| 7. | In situ reflectivity measurement of cvd diamond thin film
化学气相沉积金刚石薄膜生长的原位反射率测量 |
| 8. | Advance of optical chemical vapor deposition diamond thin films
化学气相沉积光学级金刚石薄膜的研究进展 |
| 9. | Electrochemical properties of chemically vapor deposited carbon electrode
化学气相沉积碳电极的电化学特性 |
| 10. | Uhv target chamber system
金属有机化合物气相沉积装置 |
