| 1. | Sims measuring widths of interfaces in sputter depth profiling using sims
用次级离子质谱法 |
| 2. | Ion mass spectrum and its application continue
离子质谱及其应用续 |
| 3. | Secondary ion mass spectrometry
二次离子质谱法 |
| 4. | Secondary ion mass spectrometer
二次离子质谱计 |
| 5. | Simultaneous determination of multiple poison in biological samples by time - sharing gc ms sim
用分时选择离子质谱法一次检测多种药物 |
| 6. | Surface chemical analysis - information format for static secondary - ion mass spectrometry
表面化学分析.静态次生离子质谱法的信息格式 |
| 7. | Surface chemical analysis - secondary - ion mass spectrometry - determination of relative sensitivity factors from ion - implanted reference materials
表面化学分析.次级离子质谱法.测定离子注入标样的相对灵敏系数 |
| 8. | Surface chemical analysis - secondary ion mass spectrometry - determination of boron atomic concentration in silicon using uniformly doped materials
表面化学分析.次级离子质谱法.利用均匀掺杂材料测定硅中硼原子浓度 |
| 9. | Surface chemical analysis - secondary - ion mass spectrometry - method for estimating depth resolution parameters with multiple delta - layer reference materials
表面化学分析.次级离子质谱法.多层标准材料深度溶解参数的估算方法 |
| 10. | Among the destructive techniques able to provide the desired depth resolution the most widely used technique is secondary - ion - mass spectroscopy ( sims )
在可以提供所希望的纵向分辨率的损伤技术中，最广泛运用的是二次离子质谱（ sims ） 。 |
