English translation for "移相掩模"

phase-shift masks

Related Translations:

掩网:  cover netthrow net

掩卷:  close a book get squeezed while shutting a door lid etc

掩始:  disa earancedisappearance

图像掩模:  pattern mask

光学掩模:  optical mask

逆掩断层:  overthrust faultoverthrustfault

孔眼掩模:  aperture mask

掩耳却步:  close the ears and step back

掩模对准:  mask alignment

掩星法:  occultation methodradio occultation

Example Sentences:

	1.	A phase - compatibility rule checker for standard cell layout designed with alternating psm 一种用于标准单元版图交替移相掩模相位兼容性规则检查的工具
	2.	The paper is for verification and design of manufacturability of opc and psm as these two ways have become the most important correction ways 由于光学邻近校正和交替移相掩模已经成为最主要的掩模校正方法，因此本文主要针对这两种方法进行可制造性的验证和设计。
	3.	A soft - ware implementing this method is presented as well , which has the capabilities of verifying standard cell layout , locating features with phase conflicts and giving out suggestions for modification 基于此方法的软件工具能够检查标准单元版图，找出不符合交替移相掩模设计要求的图形，并给出相关的修改建议。
	4.	Before more advanced lithography tool is produced , in order to use current tools to manufacture vdsm ic , reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry 在波长更小的光刻系统出现前，为了能利用现有设备解决集成电路的可制造性问题，工业界提出了对掩模作预失真(光学邻近校正)和在掩模上加相位转移模(移相掩模)等的掩模校正方法。
	5.	The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts , including for dark field and for clear field . the method has the capabilities of verifying standard cell layout , locating features with phase conflicts and giving out suggestion for modification 第二部分针对由传统方法设计出的版图不能满足交替移相掩模要求的问题，介绍了一种基于标准单元的交替移相掩模可制造性验证与设计的算法，包括针对暗场和亮场两种不同环境版图的算法。
	6.	However , in current design flow , designers do not consider whether designs are friendly to opc before they are sent to foundries . in fact , a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments . so even though such designs are corrected , many lithographic errors still exist 然而，由于在当前的集成电路设计流中，在设计出的版图送到制造厂商前，电路的设计者并没有考虑版图对光学邻近校正和交替移相掩模的友好性问题，这使得版图中的一些图形由于周围条件的限制，如无法充分进行光学邻近校正，无法进行交替移相掩模的处理等，从而使得版图设计即使进行了校正处理，还存在大量光刻故障的可能性。

Similar Words：

"移相式环行器" English translation, "移相示功图" English translation, "移相网络" English translation, "移相位, 相移" English translation, "移相循环器" English translation, "移相掩膜" English translation, "移相用自耦变压器" English translation, "移相振荡电路" English translation, "移相振荡器" English translation, "移相自耦变压器" English translation