| 1. | Influence of film stress on film measure and usage
薄膜应力对薄膜测量和使用的影响 |
| 2. | A highly sensitive local curvature metrology for internal stress detection in thin films
基于局部基底弯曲法的高灵敏度薄膜应力测试技术 |
| 3. | The film stress decreased with increasing annealing temperature , while increases with increasing oxygen argon ratio
薄膜应力随着退火温度的增加而减小,随着氧氩比的增大而增大。 |
| 4. | Studies on the stress of copper interconnects include the stress measurement by xrd , computer simulation and observation the local stress distribution with snam
利用薄膜应力测试分布仪和xrd测量硅基铜膜及铜互连线薄膜宏观应力。 |
| 5. | I find that the crystallization performance is the best at laser power density 300mj / cm2 . it means crystallization degree is the best , grains are the most uniformity and film stress is the least
实验发现在能量密度为300mj cm ~ 2时晶化性能较好，即晶化度最高，晶粒最大且均匀，薄膜应力最小。 |
| 6. | The existence of perforation affects buckling characteristic and load capacity of members and makes the design formula different with that of non - perforated members
孔的存在导致薄膜应力的重新分布，影响构件的屈曲特性和承载能力，使得无孔构件的分析与设计公式不再适用于开孔构件，因此有必要研究开孔构件。 |
| 7. | This paper presents the technological design and the process of manufacture of yb film stress sensor , which are verified to be feasible by material testing and sensor calibrating in dynamic and static states
介绍了镱薄膜应力传感器的工艺设计和制造过程，通过传感器的静态、动态标定及材料测试，验证了新的工艺设计和制造过程是正确可行的。 |
| 8. | Abstract : this paper presents the technological design and the process of manufacture of yb film stress sensor , which are verified to be feasible by material testing and sensor calibrating in dynamic and static states
文摘:介绍了镱薄膜应力传感器的工艺设计和制造过程，通过传感器的静态、动态标定及材料测试，验证了新的工艺设计和制造过程是正确可行的。 |
| 9. | On the other hand , if the introduction of the residual stress is fully understood , one can make good use of the strain induced by the lattice mismatch between the film and the substrate to modulate and improve the properties of the ferroelectric thin films
另一方面,如果人们能够对薄膜应力的产生机制有较深刻全面的理解,就可能通过适当的制备手段来利用薄膜与基片间的应变效应来调制和提高薄膜的性能。 |
