| 1. | A method of adjustment for four - dimensional optical system
一种四维光学仪器像面的装调方法 |
| 2. | Integration technology of stabilized electro - optical sight system
光电稳瞄系统装调的关键技术 |
| 3. | Responsibility for product auditing engine assembly and adjustment
实施发动机装调质量的产品审核。 |
| 4. | In order to improve the accuracy , appropriate 4 - bar targets are chosen according to academic calculation
这种焦距测量方法，原理简单直接，测量范围大，对于热成像系统的检测与装调，有着很好的实际应用价值。 |
| 5. | Being one of the key technologies of euvl , the alignment of optical lithography system affects directly the final imaging quality of the system
作为euvl关键技术之一，微缩投影光学系统的精密装调直接影响着系统的最终成像质量。 |
| 6. | Because of the influence of alignment error on ground and launch vibration , it is impossible for eut to keep four channels parallel perfectly . and this will bring error of observation
由于在地面装调以及发射过程中的影响无法保证四个通道轴向严格平行，进而带来观测上的误差。 |
| 7. | Finally , the schwarzschild objective of euvl is assembled and aligned on the common - axis illuminated structure with the wfe of 0 . 0202x ( a , = 632 . 8nm ) rms . using an off - axis circular subaperture of the full annular pupil , the wfe of the schwarzschild objective is 0 . 0144a , ( x = 632 . 8nm ) rms
最终对euvl系统中的schwarzschild微缩投影光学系统进行装调，验证了系统装调的收敛性，装调后系统的最终波像差为0 . 0144 rms ( = 632 . 8nm ) 。 |
| 8. | Integrated optomechanical analysis devides rigid - body and aberration , then computes the pv and rms . it provides guidance for design , tolerances allocation and alignment of optomechanical system . finally , abberations are converted to a sort of data form that can be imported by corresponding optical design software to observe their impact upon the optomechanical system imaging performance
光机集成有限元分析方法就是通过分离三种形式的刚体位移和光学表面畸变的pv值和rms值，指导光机系统的设计、误差分配和装调，并将数据转换成光学分析软件codev可接收的数据形式，对光机系统做整体成像性能评价。 |
| 9. | Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o . lum - pattern . in recent years , several key technologies have been developed rapidly such as laser producing plasma source , extreme ultraviolet multilayer , optical fabrication and metrology , projection - camara alignment , low - defect mask and control technology of stage
极紫外投影光刻( extremeultravioletlithography简称euvl )最有可能成为下一世纪生产线宽小于0 . 1 m集成电路的技术，近年来在激光等离子体光源、极紫外多层膜、光学加工和检测、光学精密装调、低缺陷掩模、光刻胶技术以及高稳定工作台系统控制等关键技术方面得到了飞速发展。 |
| 10. | By many experiments and analysis , we could prove that our aspheric surface measuring instrument in miniature reaches the request of designment . it could meet the measuring requirement of laboratory and optical shop for grinding surface , its practical testing precision is 1 - 2um . meanwhile it is suitable for final testing of optical element with reasonable accuracy
通过多次实验以及数据处理、分析，证明自行设计、装调的非球面轮廓仪以及测量软件达到了设计的精度要求，可满足实验室，光学加工车间对小型非球面光学元件精磨阶段面形的检测要求，其实用精度为1 - 2um 。 |
