| 1. | The prospect for the maskless lithography technology 无掩模光刻技术的前景 |
| 2. | The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division 摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。 |
| 3. | Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography 模拟和实验结果表明,对点阵或孔阵图形,在同样的图形尺度下,无掩模干涉光刻比传统光刻简单得多。 |
| 4. | Complex 3 - dimension ( 3d ) microstructures can be constructed using this technique with the advantages of being maskless , single step , real 3d structure and high resolution 我们展示了一个有潜力应用于组织工程及生医领域之新颖的微制造技术双光子吸收光致聚合法,它所使用之基材为液态高分子材料。 |
| 5. | The basic principle , theory , main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution , deep sub - micron and nanometer patterns in large field of view are deeply investigated 深入研究了无掩模激光干涉光刻技术用于高分辨、大视场、深亚微米和纳米图形生成的基本原理、理论、主要类型和实现方法。 |
| 6. | Based on light interference , diffraction and optical holography theory , the paper comprehensively describes the basic principle , main types , development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography 本论文基于光的干涉和衍射及光学全息照相理论,综合评述了光学光刻的基本原理、主要类型、发展趋势及开展激光无掩模干涉光刻和全息光刻研究的目的和意义。 |
| 7. | An interferometric lithographic experimental system with maskless and multi - beam exposure is built . an experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi - beam , multiple - exposure interferometric lithography research is proposed . the experimental study on interferometric lithography is carried out 建立了无掩模多光束多曝光干涉光刻实验系统,提出了一种采用梯形棱镜进行波前分割和利用可选择光阑进行多种多光束多曝光干涉光刻研究的实验系统,进行了干涉光刻实验研究,对模拟和实验结果进行了分析。 |
| 8. | The theoretical research , computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view , high resolution , distortionless , relatively simple system structure , low costs and convenient realization way . they have a broad application prospect 激光干涉光刻技术研究四川大学博士学位论文理论研究、计算模拟和实验结果分析表明,无掩模激光干涉光刻和全息光刻具有大视场、高分辨率、无畸变、系统相对简单、成本较低,实现方便等特点,具有广阔的应用前景。 |
| 9. | All this has laid a strong foundation for selecting a subject of maskless afm nanolithography , i . e . , field - induced oxidation of si semiconductor . in chapter two , a high - intensity current between a probe tip and a sample is discussed first . electrical intensity between them is simulated using matlab software after an electrical model is introduced , thus theoretically analyzing the effect of tip radii , tip - sample separation , radii at the sample , and biases on the morphology of field - induced oxidation 第二章首先讨论了扫描探针与样品之间的高密度电流,得出了电流密度与偏置电压和探针?样品间距密切相关,其关系不能以简单的线性或指数函数来表述的结论;然后引进了扫描探针场致加工的电场模型,利用matlab模拟探针与样品之间的电场强度,分析了扫描探针加工条件包括探针针尖曲率半径、探针-样品间距、样品平面半径以及偏置电压等对场致氧化物几何形态的影响。 |
| 10. | The methods and systems ( including amplitude division double - beam interference system , three - beam interference system , liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared 研究和比较了振幅分割无掩模激光干涉光刻方法和系统,包括振幅分割双光束干涉系统、三光束干涉系统、液浸式深紫外干涉系统及全自动干涉光刻系统。 |