| 1. | Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer .
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。 |
| 2. | Analysis of nanometrology and atom photolithography
纳米计量与原子光刻技术分析 |
| 3. | The prospect for the maskless lithography technology
无掩模光刻技术的前景 |
| 4. | Recent progress in photolithography technology
光刻技术及其新进展 |
| 5. | The paper also emphatically studies some main applications of interferometric lithographic technology
故本文还着重研究了干涉光刻技术的一些主要应用。 |
| 6. | The research results show that iil can get the high resolution more effectively than conventional optical lithography ( ol )
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。 |
| 7. | With the rapid progress in microfabrication technology in recent years , it is of practical significance to design and consider subwavelength optical elements
近年来，微加工技术和纳米光刻技术的快速发展，使得设计亚波长光学元件具有实际意义。 |
| 8. | The structure and basic theory of the electrical control system of the precision workbench . it is applied in quasi - molecular laser photolithographic technology
本文论述了精密工作台电控系统的结构及工作原理，它主要应用于准分子激光光刻技术中。 |
| 9. | In order to enable the potential capability of interferometric lithography technology being applied in much more fields , the further deeper research is necessary
本文涉及的研究仅仅是干涉光刻研究的起步，为使干涉光刻技术的潜在能力在众多的领域中得到实际应用，更进一步的深入研究是十分必要的。 |
| 10. | Finally , ldw technology on spherical substrate is discussed . the problems in writing process are analyzed in detail and its solutions are given . some primary experimental results are provided
开展了球面激光直写光刻技术研究，分析了球面直写光刻工艺实验难点，提出了有效的解决办法，进行了初步的实验研究。 |
