| 1. | Preparation and performances of antireflective coating
减反射薄膜的制备及其性能 |
| 2. | Termninology relating to measurements taken on thin , reflecting films
在反射薄膜上测量的相关术语 |
| 3. | Effects of vacuum annealing on the performance of 355nm al2o3 mgf2 high reflectance coatings
2高反射薄膜性能的影响 |
| 4. | Standard test method for strain gradient measurements of thin , reflecting films using an optical interferometer
用光学干涉仪测量反射薄膜应变梯度的标准试验方法 |
| 5. | Standard test method for residual strain measurements of thin , reflecting films using an optical interferometer
用光学干涉仪测量反射薄膜残余应力的标准试验方法 |
| 6. | Standard test method for in - plane length measurements of thin , reflecting films using an optical interferometer
用光学干涉仪测量反射薄膜共面长度的标准试验方法 |
| 7. | Heat mirror insulating glass may use spectral selective film at various visible light transmittance , to satisfy different design requirement of natural lighting and solar heat rejection
热镜中空玻璃产品可以运用各种可见光透过率的光谱选择性反射薄膜，以满足不同的采光和阳光遮蔽设计要求。 |
| 8. | Heat mirror ? insulating glass may use spectral selective film at various visible light transmittance , to satisfy different design requirement of natural lighting and solar heat rejection
热镜中空玻璃产品可以运用各种可见光透过率的光谱选择性反射薄膜，以满足不同的采光和阳光遮蔽设计要求。 |
| 9. | At all level of visible light transmittance , the high performance ultraviolet absorbing substrate of heat mirror ? can shield over 99 . 5 % harmful ultraviolet outside
热镜中空玻璃产品可以选择各种可见光透过率的光谱选择性反射薄膜，薄膜中集成了高效紫外吸收剂，可以屏蔽99 . 5 %有害的紫外辐射入室。 |
| 10. | Firstly , the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus , and characterlized by n & k analyzer1200 , x - ray diffraction spectroscopy ( xrd ) , scanning electronic microscopy ( sem ) , alpha - step500 . and it was analyzed that the effect on performance and structure of films with the change of argon flow , total gas pressure , the substrate - to - target distance and temperature
第一、应用稳定的直流磁控溅射设备制备tio2减反射薄膜并通过n & kanalyzer1200薄膜光学分析仪、 x射线衍射分析( xrd ) 、扫描电子显微镜( sem ) 、 alpha - step500型台阶仪等仪器对薄膜进行表征,分析氧分压、总气压、工作温度、靶基距等制备工艺参数对薄膜性能结构的影响。 |
