| 1. | In table 3. 20 formula (3. 87)is evaluated for sedimentation rates of 0.01 to 5 mm year－1 .
表320是当沉积速率为001-5毫米年1时，根据方程（387）作出的估定值。 |
| 2. | Increasing part electrodepositing speed using electroforming
提高电铸局部电沉积速率试验研究 |
| 3. | But the y element has less improvement result on the deposition rate
而y对沉积速率的提高作用效果较小。 |
| 4. | An overview on the evaluation of sediment accumulation rate of lake by 137cs dating
计年法确定湖泊沉积物沉积速率研究进展 |
| 5. | The results indicate it very different of the deposital velocity among different genetic faces
结果表明，各成因相的沉积速率差异很大。 |
| 6. | A comparative study on recent sedimentation rates in lake donghu , wuhan with 210pb and 137cs dating techniques
法对比研究武汉东湖现代沉积速率 |
| 7. | The effect of deposit rate on films " structure is less important , so the limit for it is loose
沉积速率对薄膜性能的影响很小，选择范围相对较宽。 |
| 8. | The relation between surface roughness and covering pecentage was obtained by analysing the simulation result
通过对模拟数据进行处理,获得了不同沉积速率下,表面粗糙度与覆盖率之间的关系。 |
| 9. | We found that sputtering pressure and sputtering time determine the deposition rate and thickness of the a1 film , respectively
溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度。 |
| 10. | We studied the relationship of pressure , flux of sih4 and substrate temperature with deposition rate of a - si : h films
我们研究了工作气压、 sih _ 4气体流量和衬底温度等工艺条件与a - si : h薄膜沉积速率的关系。 |
