Chinese translation for "电子束曝光"

electron beam exposure
electron beam lithography
electronbeam exposure

Related Translations:

电子束形成:  electron-beam formation

截止电子束:  cut off beam

电子束密度:  electron beam density

原始电子束:  primary electron beam

电子束钻探:  electrton-beam drilling

电子束振荡器:  electron-beam generator

电子束阱:  beam trap

电子束沉积:  electron beam deposition

电子束制作:  electron beam fabrication

电子束耦合:  beam coupling

Example Sentences:

	1.	General specification of electron beam exposure system 电子束曝光机通用技术条件
	2.	Variable shaped electron beam exposure system 可变电子束曝光装置
	3.	Electron - beam photo - resist exposure 光致抗蚀剂的电子束曝光
	4.	Electron beam exposure apparatus 电子束曝光机
	5.	This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators 论文首先简要介绍了国内外电子束曝光技术的发展水平和图形发生器的工作原理。
	6.	In this article we briefly introduce the e - beam lithography techniques , and we describe our experiences in the modification of an sem into an e - beam writer 以电子显微镜改装成的简易电子束曝光机在性能上虽比不上设计精良的专业化电子束曝光机，但在很多情况下可以符合研发工作的要求，可说是经济实用的方案。
	7.	A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given , including system function , hardware and software design 本论文介绍了扫描电子束曝光机图形发生器的总体方案、系统设计、硬件实现和软件编程等，提出了一套完整的图形发生器硬件方案，并完成了图形发生器接口的设计。
	8.	Although a simply constructed scanning - electron - microscope ( sem ) - based e - beam writer can not be on a par with the commercially available multi - million - dollar e - beam writers , it offers a cost - effective solution for the research and development laboratories 在新元件研发过程中，往往希望能在短时间内不需光罩就可以作成奈米结构，电子束曝光技术提供了一套很适合这目的的解决方案。
	9.	This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide , after that , using eb - lithography and dry etching to fabricate photonic crystal holes , so can reduce the fabrication cost by a big range ; designed the moulding board , which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully , then an successful eb - lithography is realized on the structure , the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment , which grounded etching sacrificial layer by photonic crystal holes in next step 提出采用紫外光刻工艺制作传统波导结构之后，通过电子束曝光和干法刻蚀制作光子晶体小孔的工艺方案，大幅度减低了制作成本；设计出可形成空气桥结构、并且适用于电子束曝光位置识别的光刻模板，在soi材料上成功制作出带有空气桥刻蚀预留槽以及接续光波导的结构，在该结构上成功实现了光子晶体带隙波导的电子束曝光，带隙波导与接续光波导位置接续良好；最后利用预留槽进行了刻蚀牺牲层的实验，为下一步利用光子晶体小孔刻蚀牺牲层形成空气桥结构打下了基础。

Similar Words：

"电子束偏转管" Chinese translation, "电子束偏转器" Chinese translation, "电子束偏转线圈" Chinese translation, "电子束平版印刷" Chinese translation, "电子束平印术" Chinese translation, "电子束曝光机" Chinese translation, "电子束曝光器" Chinese translation, "电子束曝光系统" Chinese translation, "电子束钎焊" Chinese translation, "电子束枪" Chinese translation