| 1. | In this work , cemented carbide ( wc - co ) was used as a kind of depositional substrate and diamond was deposited upon it in an mpcvd equipment
本研究中，用自行研制的微波等离子体化学气相沉积( mpcvd )装置对在硬质合金基体上金刚石的涂层进行了研究。 |
| 2. | Recently mwpcvd ( microwave plasmas chemical vapor deposition ) technique has attracted more and more attentions of the researchers all over the world , it is a new produce technique
近年来微波等离子体化学气相沉积技术越来越受到人们的关注,它是一种新型的生产技术。 |
| 3. | The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and watercooled stainless steel reaction chamber in 2450mhz / 5 kw
详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 |
| 4. | The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel reaction chamber in 2450mhz / 5 kw
本文详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 |
| 5. | In this investigation , gas barrier property of pet has been improved by plasma enhanced chemical vapor deposition ( pecvd ) and plasma immersion ion implantation ( piii ) technologies
本文通过等离子体化学气相沉积( pecvd )和等离体浸没离子注入( piii )技术在聚酯材料表面制备了阻隔碳膜来提高气体阻隔性能。 |
| 6. | Hydrogenated amorphous silicon nitride ( a - sinx : h ) films have been deposited by helicon wave plasma enhanced chemical vapor deposition ( hwp - cvd ) , the effect of sih4 / n2 rate on the properties of the samples is systematically studied , and the critical experiment condition is obtained under which a - sinx : h films with different compositions are deposited
本工作采用螺旋波等离子体化学气相沉积( hwp - cvd )方法制备了氢化非晶氮化硅( a - sin _ x ： h )薄膜，系统地研究了不同反应气体配比对薄膜特性的影响，得到了沉积不同组分a - sin _ x ： h的典型实验条件。 |
| 7. | The fourier transform infrared ( ftir ) spectrum is an effective technology for studying the hydrogen content ( ch ) and the silicon - hydrogen bonding configuration ( si - hn ) of hudrogenated amorphous silicon ( a - si : h ) films . in the paper , ch and si - hn of a - si : h films , fabricated at different ratio of h2 / sih4 by microwave electron cyclotron resonance plasma chemical vapor ( wmecr cvd ) method , have been obtained by analyzing their ftir spectra that are treated by baseline fitting and gaussian function fitting . the effects of ratio of h2 / sih4 on ch and si - hn are studied
Fourier红外透射( ftir )谱是研究氢化非晶硅( a - si : h )薄膜中氢含量( c _ h )及硅-氢键合模式( si - h _ n )最有效的手段，对于微波等离子体化学气相沉积( mwecrcvd )方法在不同h _ 2 sih _ 4稀释比下制备出的氢化非晶硅薄膜，我们通过红外透射光谱的基线拟合、高斯拟合分析，得出了薄膜中的氢含量，硅氢键合方式及其组分，并分析了这些参数随h _ 2 sih _ 4稀释比变化的规律。 |
| 8. | By the design of microwave electric field mode and microwave mode converter ( mmc ) , the thesis participated in equipping an domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel resonant chamber in 2450mhz / 5 kw , introduced the basic machineries and functions of the sub - systems , including microwave system , gas - route system , vacuum system , detecting system and safeguard system
论文通过微波场型和模式转换器的设计，参与建立了一套2 . 45ghz 5kw带有石英玻璃窗、水冷却不锈钢谐振腔的微波等离子体化学气相沉积( mpcvd )系统( mpcvd - 4型) 。论述了包括微波系统、气路系统、真空系统、检测系统和保障系统等结构的组成及基本功能。 |
| 9. | So we applied low temperature techniques to manufacture the sense film of qcm sensors . at low temperature and low pressure , with n - butylamine as the carbon source material , and with dry hydrogen as the carrying gas , we applied r . f . glow discharge plasma to preparation the working film for the qcm sensors
在“实验与分析”一章中较为详细地阐述了采用等离子体化学气相淀积的方法，以正丁胺作为碳源物质，通过射频辉光放电在低温低压条件下制得了正丁胺等离子体淀积膜。 |
