| 1. | In the paper properties of the samples were also studied in detail
文中还详细阐述了cbd - cds薄膜样品性能的分析和测试。 |
| 2. | Standard test method for dynamic puncture resistance of roofing membrane specimens
屋顶薄膜样品的抗动态击穿的标准试验方法 |
| 3. | The test method of thin film is analyzed , which widens the using range of this test system
本文还分析了薄膜样品的测试方法,拓宽了测试系统的应用范围。 |
| 4. | The ir spectrum showed that there existed amino - group in the network structure of ctc : h film decreased along with the increase of deposition power
薄膜样品的红外光谱分析结果表明，胺基团已被成功掺入薄膜的网络结构中。并且薄膜中胺基团含量随着沉积功率增大而减少。 |
| 5. | Nano - zns : mn2 + dispersed in pvb film has the same enhancement after exposure in solar light . the material has potential on measuring the dosage of uv irradiation of solar light
薄膜样品在太阳光辐照下同样有荧光增强行为，预示该样品可以作为一种紫外辐照剂量的记录材料。 |
| 6. | The results indicate that it has an excellent surface . aln thin film was prepared from an aluminum target by dc and af reactive magnetron sputtering in nitrogen gas mixed with argon gas
氮化铝薄膜样品是利用高纯铝靶,在氮气加氩气气氛下用直流和射频反应磁控溅射法制备的。 |
| 7. | After dealing with post heating at the same deposit temperature , the average of transmission and reflectance of the films are smaller than unannealed ones but eopt is enlarged
相同沉积温度下制备的薄膜样品经过不同退火温度和退火时间处理后，薄膜的平均透过率和平均反射率都比退火前下降，光学能隙变大。 |
| 8. | Through optimization of excitation parameters of the glow - discharge source and calculation of the sputtering rate of the certified reference materials , a method for the quantitative surface analysis of nc - si : h film was established
方法应用于实际掺杂纳米硅薄膜样品的分析，并将分析深度、剖析结果与表面形貌仪的结果进行了对照。 |
| 9. | It was found that the acidification of water could also improve the photocatalyst . the photocatalyst of v and si co - doped tio2 films is improved and the hydropholicity of v and si co - doped tio2 films is reduced .
其中， 3mhpc掺杂薄膜样品和x二0 .巧的钒掺杂薄膜光催化性能和亲水性性能都比未掺杂tio :薄膜样品好，可作为自清洁薄膜。 |
| 10. | The iron doped titania thin films on stainless steel were obtained by lpd method . it was found that some fe3 + was in situ doped in the tio2 thin films , showing obvious influence on the photocatalytic activity of the samples
在500oc时，薄膜样品具有最高的光催化性能，这是由于薄膜中锐钦矿tioz晶化程度的提高和此时样品中含有适量铁离子含量。 |
