Chinese translation for "集成电路工艺技术"

integrated circuit processing technique

Related Translations:

集成电路系列:  chifamilyic familyintegrated circuit family

专用集成电路:  a lication ecific integrated circuit （asic）application specific integrated circuit asicapplication-specific integrated circuitasic application specific icasic application specific integrat

集成电路存储器:  ic memoryindegrated circuit storageintegrated circuit memoryintegrated circuit storage

集成电路片:  ic chipintegrated circuit chip

膜片集成电路:  film integrated circuit

读写集成电路:  read-write integrated circuit

线性集成电路:  integrated circuit, linearliclinear chiplinear integrated circuitlinear integration

倒装片集成电路:  flip chip integrated circuitflip-chip i.cflip-chip integrated circuit

迭层集成电路:  stacked integrated circuit

模糊逻辑集成电路:  fuzzy logic integrated circuit

Example Sentences:

	1.	Study of the silicon carbide integrate circuits technique 单片集成电路工艺技术
	2.	With the development of integrated circuit , fpga and asic have been widely used in many fields such as telecommunication . image processing , vedio compression and so on 随着集成电路工艺技术的发展， fpga和专用集成电路( asic )越来越多地应用到通信、图像处理和视频处理等领域。
	3.	With the development of integrated circuit , fpga and dsp processors have been widely used in many fields such as telecommunication , image processing , pattern recognization and so on 随着集成电路工艺技术的发展， fpga和dsp处理器越来越多地应用到通信、图像处理和模式识别等领域。
	4.	Being one of the leading foundry service enterprise , hejian is geared with an excellent management team along with state - of - art ic technology as to provide comprehensive and competitive service to her customer 公司拥有尖端的集成电路工艺技术和杰出的经营团队，为客户提供全面性及具有竞争力的服务。
	5.	By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes 研究利用常规的硅集成电路工艺技术结合电子束光刻，反应离子刻蚀和剥离等技术制备半导体和金属纳米结构，很好地解决了普通光刻与电子束光刻的匹配问题，提高了加工效率，经过多次的工艺实验，摸索出一套制备纳米结构的工艺方法，首次用电子束光刻，反应离子刻蚀和剥离等技术制备出了多种纳米结构(硅量子线、量子点，双量子点和三叉指状的金属栅结构) 。

Similar Words：

"集成电路二极管阵列 积体电路二极体阵列" Chinese translation, "集成电路放大器" Chinese translation, "集成电路放大助听器" Chinese translation, "集成电路封装" Chinese translation, "集成电路隔离技术" Chinese translation, "集成电路工艺实验室" Chinese translation, "集成电路工艺学" Chinese translation, "集成电路功率放大器" Chinese translation, "集成电路功能测试仪" Chinese translation, "集成电路公司" Chinese translation