| 1. | Positive acting resist
正型光阻剂 |
| 2. | Microlithography processes : study the interaction between photoresists and exposure light . application : microlithoghy
二)微显影制程:研究光阻与曝光光源的作用.应用:微显影 |
| 3. | Researchers have used the technique to write lines with widths of only a few nanometers in a layer of photoresist on a silicon substrate
研究人员曾使用这种技术，在矽基座上的光阻层画出宽度只有几奈米的线。 |
| 4. | The parts of the photoresist struck by the light can be selectively removed , exposing parts of the silicon wafer in a way that replicates the original pattern
光阻剂受光照射的部份可以选择性移除，因此在晶圆上露出原来图案复制的部份。 |
| 5. | The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。 |
| 6. | However a novel electrolyte that can be used for gold electroplating and is suitable for formation of patterns on wafers in the application of electronics has been developed
由于亚硫酸系之镀金溶液能被应用于电子业中，不与光阻剂反应而能成形于矽晶元上。 |
| 7. | Now , many kind of 3d microstructure fabrications were developed , in which microlithography was changing characteristics in local area of photoresister , which illuminated uv light
延伸传统精密加工方法之微加工系统方法，其中之微影加工技术是利用紫外线光线照在光阻产生变化，使得显影作用于光阻剂的局部?围。 |
| 8. | This fabrication ' s main factors were photoresister ' s reactive light wave length , uv wave length , focusing area and light intensity . this technique could easily fabricate 3d microstructures
立体微影加工之主要因素有光阻反应的波长、紫外线光波长、聚焦面积及光强度。目标为传统微机电加工难以达成之三维微结构加工。 |
| 9. | Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal , nitride etch , and other cleaning applications in semiconductor and mems fabs
射频等离子体9200是桶式炉脱模体,拥有可控制的高温系统可去除光阻材料、氮化物蚀刻和半导体与微型机电系统等方面的清洗功能 |
| 10. | A beam of light ( typically ultraviolet light from a mercury arc lamp ) shines through the chromium mask , then passes through a lens that focuses the image onto a photosensitive coating of organic polymer ( called the photoresist ) on the surface of a silicon wafer
一束光（通常是汞弧灯发出的紫外光）先穿透铬光罩，然后通过透镜把影像聚焦在晶圆表面的有机高分子感光涂料（称为光阻剂） 。 |
