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Home > english-chinese > "溅射工艺" in Chinese

Chinese translation for "溅射工艺"

sputtering technology

Related Translations:
溅射:  [半] sputtering; spurting; disintegration; spotter
反应溅射:  reactive sputtering
溅射效率:  sputtering yield
溅射泵:  sputter pump
电化学溅射:  electrochemical supttering
阴影溅射:  shadow casting
溅射沉积:  aln
背面溅射:  back spatter
离子溅射:  ion sputtering
溅射损害:  splash damage
Example Sentences:
1.Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究
2.The tcr of the as - deposited films were about 20x10 - 6 /
由优化的溅射工艺参数原位沉积的锰铜薄膜的tcr 。
3.The results showed that the sputtering technical parameters have obviously influence on zn / o , the thickness and texture of zno thin film
研究表明,磁控溅射工艺对zno薄膜的锌氧配比、厚度和织构都有很大影响。
4.In this paper , several thin films samples of vanadium oxide were got by high - frequency magnetron sputter with pure metal vanadium as sputter source
本文以高纯金属钒作为靶材,采用磁控溅射工艺制备氧化钒薄膜。
5.In order to optimize parameters of sputter - depositeing used to manufacture silicon - based tm films in the next step , the dissertation analyses and explains the difference between the two surfaces of sputtered tini film from sputtering factors
为优化溅射工艺参数以用于后续的硅基tini薄膜制备,本文从工艺因素入手,对玻璃基溅射薄膜两个表面的质量差异进行了分析,并给出合理解释。
6.Zno thin films were deposited on silicon ( si ) and glass substrate by reactive radio frequency sputtering ( rf ) technique with zinc target in the mixed gas of ar ando2 , and used zno buffer improving the quality of zno thin film . the effects of parameters on the thickness , composition , texture , morphology , optical properties and electrical properties of zno thin films had been systematically investigated by means of xrd , xps , sem , afm , pl and hall test system
采用x射线衍射( xrd ) 、 x射线光电子能谱( xps ) 、扫描电子显微镜( sem ) 、原子力显微镜( afm ) ,光致发光谱( pl )和霍尔效应测试技术系统研究了溅射工艺和退火工艺对zno薄膜的厚度、成分、织构、表面形貌、光学性能和电学性能的影响规律。
7.The surface morphologies of thin films were observed by using scan electron microscope ( sem ) and atomic force microscope ( afm ) . based on grazing incidence x - ray diffraction ( gixrd ) equipment , we find that residual stress exist in magnetron sputtering plct film , in addition , the ferroelectric properties of plct thin films were measured by radiant premier lc type multifunctional ferroelectric properties test system
利用广角x射线衍射技术对不同溅射工艺下plct薄膜的相结构进行了研究;采用扫描电子显微镜( sem )和原子力显微镜( afm )分别观察了薄膜的表面形貌;利用掠入射x射线衍射( gixrd )测量了薄膜的残余应力。
8.Among these methods , magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc . in my experiment , zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt % , 2wt % , 3wt % , 4wt % respectively ) and the films were figured by xrd , sem , xps , afm and ftir , uv photometer
本研究课题以氧化锌铝靶为靶材,采用直流磁控溅射工艺在纯氩气气氛中沉积zao薄膜。靶材中al _ 2o _ 3的掺杂比例分别为1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和红外、紫外分光光度计等测试手段对沉积的薄膜进行了表征。
9.The main research progresses of this thesis are shown as follow : 1 . the a - c films with notably different surface micro - morphology were successfully fabricated by adjusting the sputtering process . there features change from smooth to a fractal - like structure with abounding holes and complicated gofers
本论文的主要的研究工作进展如下: 1 .通过调控溅射工艺成功制备具有显著差异的表面形貌的非晶碳薄膜,其表面特征为从光滑平坦过渡到具有丰富的孔隙和极其复杂的皱褶的分形结构。
Similar Words:
"溅射二次放射系数" Chinese translation, "溅射法" Chinese translation, "溅射反应器" Chinese translation, "溅射腐蚀" Chinese translation, "溅射覆盖物" Chinese translation, "溅射回来" Chinese translation, "溅射介质薄膜" Chinese translation, "溅射刻蚀" Chinese translation, "溅射刻蚀法" Chinese translation, "溅射离子泵" Chinese translation