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Home > english-chinese > "离子束溅射" in Chinese

Chinese translation for "离子束溅射"

ion beam sputtering
ion-beam sputtering


Related Translations:
溅射:  [半] sputtering; spurting; disintegration; spotter
离子溅射:  ion sputtering
反应溅射:  reactive sputtering
溅射效率:  sputtering yield
溅射泵:  sputter pump
电化学溅射:  electrochemical supttering
阴影溅射:  shadow casting
溅射沉积:  aln
背面溅射:  back spatter
溅射损害:  splash damage
Example Sentences:
1.Property comparison of optical thin films prepared by e - beam , ion assisted deposition and ion beam sputtering
离子辅助和离子束溅射三种工艺对光学薄膜性能的影响
2.A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper . the basic principle of ibs coating machine is discussed . this paper also gives the scheme of hardware and sofeware
本文介绍了离子束溅射镀膜机膜厚控制的一种实用的系统,文中论述了离子束溅射镀膜机的工作原理及镀膜厚度控制系统的硬、软件的实现方案。
3.Abstract : based on the splashing mechanics microeffect , this paper introduced the principle of ion beam removal machining it analysed the influenced factors of production efficiency , studied the structure and working principle of the device of ion beam removal machining
文摘:从离子束溅射的微观力效应出发,介绍了离子束去除加工的原理,分析了影响加工效率的因素,并对加工装置的结构及工作原理进行了探讨。
4.We prepare the si - sio2 and ge - sio2 thin film by using the dual ion beam co - sputtering method and the rf co - sputtering technique respectively , adjusting the substrate temperature ( ts ) and the annealing temperature ( ta ) . then we analysis the structure of the thin film by using the xrd and tem
论文采用双离子束溅射和射频磁控溅射沉积技术,通过改变薄膜沉积过程中基片温度( t _ s )以及薄膜制备完成后退火温度( t _ a )分别制备了si - sio _ 2和ge - sio _ 2薄膜。
5.The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd . when the temperature ( ts < 450 , ta < 800 ) is low , the structure of the samples is still amorphous . the majority content of the sample is sio 90 by the aid of xps
利用双离子束溅射沉积技术,通过共溅射方法制备了si - sio _ 2薄膜,研究了沉积时间、工作气压p _ ( ar ) 、基片温度等对沉积速率的影响,用tem和xrd分析了样品的结构。
6.In this thesis , we research the characters on the ion beam sputtering system , and prepare tiny films and cnx / tiny multilayers by ion beam sputtering . the best parameters of preparing cnx films are explored . we use the tiny films as template to promote the growth of cnx films
本文对离子源的溅射特性进行了研究,采用离子束溅射法制备了tin _ y单层薄膜和cn _ x tin _ y多层薄膜,探索该法制备cn _ x薄膜的最佳工艺参数,并利用tin _ y薄膜为衬底以促进cn _ x薄膜的生长。
Similar Words:
"离子束轨道半径" Chinese translation, "离子束技术" Chinese translation, "离子束加工" Chinese translation, "离子束加工设备" Chinese translation, "离子束溅镀系统" Chinese translation, "离子束节" Chinese translation, "离子束聚变" Chinese translation, "离子束聚变装置" Chinese translation, "离子束聚焦" Chinese translation, "离子束刻蚀法" Chinese translation